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於矽晶片上形成太陽能電池之矽鍺層的方法

dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI377690zh_TW
dc.contributor.author張翼en_US
dc.contributor.author唐士軒en_US
dc.contributor.author林岳欽en_US
dc.date.accessioned2014-12-16T06:16:33Z
dc.date.available2014-12-16T06:16:33Z
dc.date.issued2012-11-21en_US
dc.description.abstract本發明係在矽基板上成長矽鍺層,並在其上成長三五族化合物半導體太陽能電池。首先在矽晶片上使用矽離子佈植方法以促進矽晶片和矽鍺磊晶層的鬆弛,降低矽鍺磊晶層的厚度,再於矽基板上生長無應力的P型摻雜矽鍺緩衝層,藉以降低三五族高效率太陽能電池生產成本。並於矽鍺緩衝層上形成三五族高效率太陽能電池。zh_TW
dc.identifier.govdocH01L031/18zh_TW
dc.identifier.govdocH01L021/20zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/105951
dc.language.isozh_TWen_US
dc.title於矽晶片上形成太陽能電池之矽鍺層的方法zh_TW
dc.typePatentsen_US

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