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Beam Shaping of GaN/InGaN Vertical-Injection Light Emitting Diodes via High-Aspect-Ratio Nanorod Arrays

dc.citation.epage450en_US
dc.citation.spage449en_US
dc.contributor.authorTsai, M. A.en_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorChao, C. L.en_US
dc.contributor.authorChiu, C. H.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorHuang, J. J.en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:25:06Z
dc.date.available2014-12-08T15:25:06Z
dc.date.issued2009en_US
dc.description.abstractThe enhanced light extraction and collimated output beam profile from GaN/InGaN vertical-injection light emitting diodes are demonstrated utilizing high-aspect-ratio nanorod arrays. The nanorod arrays are patterned by self-assembled silica spheres, followed by inductively-coupled-plasma reactive-ion-etching. (C) 2008 Optical Society of Americaen_US
dc.identifier.isbn978-1-4244-5184-5en_US
dc.identifier.journal2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/17483
dc.identifier.wosnumberWOS:000274751300226
dc.language.isoen_USen_US
dc.titleBeam Shaping of GaN/InGaN Vertical-Injection Light Emitting Diodes via High-Aspect-Ratio Nanorod Arraysen_US
dc.typeProceedings Paperen_US

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