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A new bride damage characterization technique for evaluating hot carrier reliability of flash memory cell after P/E cycles

dc.citation.epage112en_US
dc.citation.spage111en_US
dc.contributor.authorChung, SSen_US
dc.contributor.authorYih, CMen_US
dc.contributor.authorCheng, SMen_US
dc.contributor.authorLiang, MSen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:27:25Z
dc.date.available2014-12-08T15:27:25Z
dc.date.issued1997en_US
dc.identifier.isbn4-930813-75-1en_US
dc.identifier.journal1997 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/19676
dc.identifier.wosnumberWOS:A1997BJ59D00053
dc.language.isoen_USen_US
dc.titleA new bride damage characterization technique for evaluating hot carrier reliability of flash memory cell after P/E cyclesen_US
dc.typeProceedings Paperen_US

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