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三五族半導體元件之歐姆接觸電極及其製造方法

dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201115735zh_TW
dc.contributor.author張翼en_US
dc.contributor.author郭建億en_US
dc.contributor.author張俊彥en_US
dc.date.accessioned2014-12-16T06:12:20Z
dc.date.available2014-12-16T06:12:20Z
dc.date.issued2011-05-01en_US
dc.description.abstract使用重摻雜之磊晶矽鍺材料或具有不同銦含量之磊晶砷化銦鎵材料來形成三五族半導體元件之源極與汲極,以透過矽鍺材料或砷化銦鎵材料對於三五族半導體元件通道所施加的應力來增加電子移動率。zh_TW
dc.identifier.govdocH01L029/778zh_TW
dc.identifier.govdocH01L021/338zh_TW
dc.identifier.govdocH01L021/28zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/103605
dc.language.isozh_TWen_US
dc.title三五族半導體元件之歐姆接觸電極及其製造方法zh_TW
dc.typePatentsen_US

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