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Investigation of Void Nucleation and Propagation in the Joule Heating Effect During Electromigration in Flip-Chip Solder Joints

dc.citation.epage2494en_US
dc.citation.issue11en_US
dc.citation.spage2489en_US
dc.citation.volume39en_US
dc.contributor.authorChang, Y. W.en_US
dc.contributor.authorChiu, S. H.en_US
dc.contributor.authorChen, Chihen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:07:38Z
dc.date.available2014-12-08T15:07:38Z
dc.date.issued2010-11-01en_US
dc.description.abstractThis study analyzes the effect of void propagation on the temperature increase of solder joints by using x-ray microscopy, Kelvin probes, and infrared microscopy. It was found that the temperature rise due to void formation was less than 1.3 degrees C when the voids depleted about 75% of the contact opening, even though bump resistance had increased to 10.40 times its initial value. However, the temperature rose abruptly with an increase of up to 8.0 degrees C when the voids depleted 96.2% of the contact opening. A hot spot was observed immediately before the occurrence of open failure in the solder bump. The local increase in temperature was about 30.2 degrees C at the spot. This spot may be the remaining contact area immediately before the occurrence of open failure.en_US
dc.identifier.doi10.1007/s11664-010-1361-7en_US
dc.identifier.issn0361-5235en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.identifier.urihttp://dx.doi.org/10.1007/s11664-010-1361-7en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6012
dc.identifier.wosnumberWOS:000283007300021
dc.language.isoen_USen_US
dc.subjectElectromigrationen_US
dc.subjectflip-chip solder jointsen_US
dc.titleInvestigation of Void Nucleation and Propagation in the Joule Heating Effect During Electromigration in Flip-Chip Solder Jointsen_US
dc.typeArticle; Proceedings Paperen_US

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