Plasma device for liquid crystal alignment
| dc.citation.patentcountry | USA | zh_TW |
| dc.citation.patentnumber | 20080129207 | zh_TW |
| dc.contributor.author | Chao, Ru-Pin | en_US |
| dc.contributor.author | Wu, Hsin-Ying | en_US |
| dc.contributor.author | Wang, Chih-Chieh | en_US |
| dc.contributor.author | Chang, Shao-Ju | en_US |
| dc.contributor.author | Hwang, Jenn-Chang | en_US |
| dc.contributor.author | Kou, Chwung-Shan | en_US |
| dc.contributor.author | Wu, Kuen-Yi | en_US |
| dc.contributor.author | Lee, An-Ping | en_US |
| dc.contributor.author | Wei, Hsiao-Kuan | en_US |
| dc.date.accessioned | 2014-12-16T06:15:57Z | |
| dc.date.available | 2014-12-16T06:15:57Z | |
| dc.date.issued | 2008-06-05 | en_US |
| dc.description.abstract | A device utilizes a plasma for a liquid crystal alignment. The alignment is processed in a vacuum chamber in a simple way. A general chemical vapor deposition is coordinated to reduce cost. The present invention is a novel contactless process avoiding particle contamination, residual static charge and scratch. And multiple are as of the present invention can be used for alignment. | zh_TW |
| dc.identifier.govdoc | H05H001/46 | zh_TW |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/105596 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | Plasma device for liquid crystal alignment | zh_TW |
| dc.type | Patents | en_US |