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Resonant rutherford backscattering studies of cerium oxide thin films deposited by RF sputtering

dc.citation.epage1406en_US
dc.citation.issue2en_US
dc.citation.spage1403en_US
dc.citation.volume7en_US
dc.contributor.authorChin, CCen_US
dc.contributor.authorLin, RJen_US
dc.contributor.authorYu, YCen_US
dc.contributor.authorWang, CWen_US
dc.contributor.authorLin, EKen_US
dc.contributor.authorTsai, WCen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:01:43Z
dc.date.available2014-12-08T15:01:43Z
dc.date.issued1997-06-01en_US
dc.description.abstractWe have studied the stoichiometry of cerium oxide films deposited by RF sputtering on sapphire and MgO as a function of deposition conditions using the resonant Rutherford backscattering method. We found that some films have the off-stoichiometry of CeOy with y greater than 2.0. Such an off-stoichiometry cannot be due to a mixture of the known phases of bulk cerium oxide samples. This may be due to either cerium vacancies or interstitial oxygen atomic impurities. The cerium ion x-ray photoemission spectra of those films cannot determine the vacancy of the cerium ions. The c-axis YBaCuo thin flims deposited by sputtering on the CeO3.3 buffer layer on saphhire was found to be epitaxial. The T-c was 86 K with Delta T-c less than 1 K.en_US
dc.identifier.issn1051-8223en_US
dc.identifier.journalIEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITYen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/496
dc.identifier.wosnumberWOS:A1997XH86600072
dc.language.isoen_USen_US
dc.titleResonant rutherford backscattering studies of cerium oxide thin films deposited by RF sputteringen_US
dc.typeArticle; Proceedings Paperen_US

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