193奈米微影解像度增進技術---高透射率嵌附層之研製、應用探討與模擬
| dc.contributor.author | 龍文安 | en_US |
| dc.contributor.author | Loong Wen-an | en_US |
| dc.contributor.department | 交通大學應用化學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:34:53Z | |
| dc.date.available | 2014-12-13T10:34:53Z | |
| dc.date.issued | 2002 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC91-2215-E009-064 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=784474&docId=150790 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/93058 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 193奈米微影解像度增進技術---高透射率嵌附層之研製、應用探討與模擬 | zh_TW |
| dc.title | 193 nm Resolution Enhancement Techniques---Fabrication, Application Study and Simulation of High Transmittance Embedded Layers | en_US |
| dc.type | Plan | en_US |
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