考慮能產生友善三重曝光樣形以及平衡光罩密度的非點格式細部繞線器

dc.contributor.author	李毅郎	en_US
dc.contributor.author	Li Yih-Lang	en_US
dc.contributor.department	國立交通大學資訊工程學系（所）	zh_TW
dc.date.accessioned	2014-12-13T10:44:21Z
dc.date.available	2014-12-13T10:44:21Z
dc.date.issued	2014	en_US
dc.description.sponsorship	科技部	zh_TW
dc.identifier.govdoc	MOST103-2221-E009-223	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=8350958&docId=445293	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/99994
dc.language.iso	zh_TW	en_US
dc.title	考慮能產生友善三重曝光樣形以及平衡光罩密度的非點格式細部繞線器	zh_TW
dc.title	Triple-Pattern-Lithography-Friendly and Mask-Density-Balancing-Aware Gridless Detailed Routing	en_US
dc.type	Plan	en_US

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