極紫外光(EUV)微影技術從光源建造、光罩、材料、製程到奈米元件可靠度研究(II)
| dc.contributor.author | 黃遠東 | en_US |
| dc.contributor.author | HUANG YANG-TUNG | en_US |
| dc.contributor.department | 國立交通大學電子工程學系及電子研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:49:21Z | |
| dc.date.available | 2014-12-13T10:49:21Z | |
| dc.date.issued | 2009 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC98-2120-M009-007 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=1888371&docId=312332 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/101605 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 極紫外光(EUV)微影技術從光源建造、光罩、材料、製程到奈米元件可靠度研究(II) | zh_TW |
| dc.title | Investigations on Extreme Ultraviolet Lithography (Euvl) from Beamline Construction, Masks, Materials, Processes, to Reliability of Nano Devices (II) | en_US |
| dc.type | Plan | en_US |