Al2O3 films formed by anodic oxidation of Al-1wt.%Si-0.5wt%Cu films
| dc.citation.epage | 665 | en_US |
| dc.citation.spage | 662 | en_US |
| dc.contributor.author | CHIU, S | en_US |
| dc.contributor.author | CHANG, PH | en_US |
| dc.contributor.author | TUNG, CH | en_US |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:27:53Z | |
| dc.date.available | 2014-12-08T15:27:53Z | |
| dc.date.issued | 1994 | en_US |
| dc.identifier.isbn | 3-88355-199-6 | en_US |
| dc.identifier.journal | THIN FILMS: PROCEEDINGS OF THE JOINT 4TH INTERNATIONAL SYMPOSIUM ON TRENDS AND NEW APPLICATIONS IN THIN FILMS - TATF '94 AND THE 11TH CONFERENCE ON HIGH VACUUM, INTERFACES AND THIN FILMS - HVITF '94 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/20150 | |
| dc.identifier.wosnumber | WOS:A1994BD74L00146 | |
| dc.language.iso | en_US | en_US |
| dc.title | Al2O3 films formed by anodic oxidation of Al-1wt.%Si-0.5wt%Cu films | en_US |
| dc.type | Proceedings Paper | en_US |
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