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Light Emitting Diode Device Having Super Lattice Structure and a Nano-Structure Layer

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20150287879zh_TW
dc.contributor.authorLEE Chia-Yuen_US
dc.contributor.authorLIN Da-Weien_US
dc.contributor.authorTZOU An-Jyeen_US
dc.contributor.authorKUO Hao-Chungen_US
dc.date.accessioned2015-12-04T07:03:15Z
dc.date.available2015-12-04T07:03:15Z
dc.date.issued2015-10-08en_US
dc.description.abstractA light emitting diode device is provided, which comprises a silicon-based substrate, a buffer layer, a super lattice structure layer, a nano-structure layer, a first semiconductor layer, a light emitting layer, and a second semiconductor layer. The buffer layer is formed on the silicon-based substrate, the super lattice structure layer is formed on the buffer layer, the nano-structure layer is formed on the super lattice structure layer, a first semiconductor layer is formed on the nano-structure layer, and the light emitting layer is formed between the first semiconductor layer and the second semiconductor layer. The super lattice layer and the nano-structure can release the stress within the light emitting diode device, and reduce the epitaxy defect, so that the internal quantum effect and the external quantum effect can be increased.zh_TW
dc.identifier.govdocH01L033/12zh_TW
dc.identifier.govdocH01L033/06zh_TW
dc.identifier.govdocH01L033/32zh_TW
dc.identifier.govdocH01L033/00zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/128696
dc.language.isozh_TWen_US
dc.titleLight Emitting Diode Device Having Super Lattice Structure and a Nano-Structure Layerzh_TW
dc.typePatentsen_US

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