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新型低溫多晶矽薄膜電晶體結構設計及其製作方法與可靠性研究(I)

dc.contributor.author張國明en_US
dc.contributor.authorCHANG KOW-MINGen_US
dc.contributor.department國立交通大學電子工程研究所zh_TW
dc.date.accessioned2014-12-13T10:33:35Z
dc.date.available2014-12-13T10:33:35Z
dc.date.issued2003en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC92-2215-E009-065zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=873556&docId=167361en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/92149
dc.language.isozh_TWen_US
dc.title新型低溫多晶矽薄膜電晶體結構設計及其製作方法與可靠性研究(I)zh_TW
dc.titleFabrication and Reliability of Novel Low Temperature Poly-Silicon Thin Film Transistors Structure Design (I)en_US
dc.typePlanen_US

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