Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology
| dc.citation.epage | 265 | en_US |
| dc.citation.spage | 260 | en_US |
| dc.citation.volume | 2879 | en_US |
| dc.contributor.author | Yeh, CF | en_US |
| dc.contributor.author | Lee, YC | en_US |
| dc.contributor.author | Su, JL | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:27:34Z | |
| dc.date.available | 2014-12-08T15:27:34Z | |
| dc.date.issued | 1996 | en_US |
| dc.identifier.isbn | 0-8194-2277-0 | en_US |
| dc.identifier.journal | MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19813 | |
| dc.identifier.wosnumber | WOS:A1996BG41M00027 | |
| dc.language.iso | en_US | en_US |
| dc.subject | low-stress | en_US |
| dc.subject | liquid phase deposition | en_US |
| dc.subject | LPD | en_US |
| dc.subject | SiO2-xFx | en_US |
| dc.subject | selective deposition | en_US |
| dc.title | Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology | en_US |
| dc.type | Proceedings Paper | en_US |
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