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矽與矽鍺材料及元件之發展---子計畫一:矽與矽鍺材料及物理特性研究

dc.contributor.author施敏en_US
dc.contributor.department交通大學電子工程系zh_TW
dc.date.accessioned2014-12-13T10:38:38Z
dc.date.available2014-12-13T10:38:38Z
dc.date.issued1997en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC86-2215-E009-020zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=293153&docId=53655en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/95567
dc.language.isozh_TWen_US
dc.subject矽zh_TW
dc.subject鍺zh_TW
dc.subject化學氣相沈積法zh_TW
dc.subject化學分子束磊晶zh_TW
dc.subject超晶格zh_TW
dc.subject量子霍耳效應zh_TW
dc.subjectSiliconen_US
dc.subjectGermaniumen_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.subjectChemical molecular epitaxy (CME)en_US
dc.subjectSuperlatticeen_US
dc.subjectQuantum hall effecten_US
dc.title矽與矽鍺材料及元件之發展---子計畫一:矽與矽鍺材料及物理特性研究zh_TW
dc.titleThe Study of Si/SiGe Material and Physical Characterizationen_US
dc.typePlanen_US

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