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以電子背散射繞射儀(EBSD)來研究錫膜的電遷移行為

dc.contributor.author陳智en_US
dc.contributor.authorChen Chihen_US
dc.contributor.department交通大學材料科學與工程系zh_TW
dc.date.accessioned2014-12-13T10:31:38Z
dc.date.available2014-12-13T10:31:38Z
dc.date.issued2004en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC93-2216-E009-018-Yzh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=913158&docId=172684en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/91087
dc.language.isozh_TWen_US
dc.title以電子背散射繞射儀(EBSD)來研究錫膜的電遷移行為zh_TW
dc.titleStudy of Electromigration Behavior in Sn Films Using EBSDen_US
dc.typePlanen_US

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