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Nano-carbon nitride synthesis from a bio-molecular target for ion beam sputtering at low temperature

dc.citation.epage609en_US
dc.citation.issue2-5en_US
dc.citation.spage605en_US
dc.citation.volume8en_US
dc.contributor.authorWu, JJen_US
dc.contributor.authorLu, TRen_US
dc.contributor.authorWu, CTen_US
dc.contributor.authorWang, TYen_US
dc.contributor.authorChen, LCen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorKuo, CTen_US
dc.contributor.authorChen, TMen_US
dc.contributor.authorYu, YCen_US
dc.contributor.authorWang, CWen_US
dc.contributor.authorLin, EKen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:46:46Z
dc.date.available2014-12-08T15:46:46Z
dc.date.issued1999-03-01en_US
dc.description.abstractNano-crystalline carbon nitride has been successfully synthesized at a temperature below 100 degrees C from an adenine(C5N5H5) target sputtered by an Ar ion beam. Because adenine possesses a ring structure similar to the hypothetical beta-C3N4 phase, the use of this bio-molecular compound as the target is believed to reduce the energy barrier of carbon-nitride growth. The effect of Ar ion-sputtering voltage on the film growth and the effect of extra-N-atom incorporation on the carbon-nitride film growth are examined in this study. Only a carbon film is formed with an ion energy of 500 V. For the ion-beam energy above 750 V, carbon nitride films are deposited, and there is some hydrogen incorporation in the films. The N/C composition ratio in the films could reach 1:1 and is independent on the ion beam voltage. The nitrogen is bonded with carbon within the films, as determined by the IR and XPS measurements. However, the films deposited at a higher ion voltage could possess some original functional groups of adenine. A strong and broad peak at a d-spacing of 0.32 nm, comparable to the calculated d-spacing of the beta-C3N4(110), is observed in the XRD spectra of the carbon nitride films. The TEM results indicated that the film contained nano-crystalline grains. Several d values are also in good agreement with those of adenine and the calculated values of beta-C3N4. The C/N ratios of the films are still kept at almost 1:1 with N atoms added during deposition. The XRD spectra and IR spectra of these films are all similar to the film deposited without nitrogen source. (C) 1999 Elsevier Science S.A. All rights reserved.en_US
dc.identifier.issn0925-9635en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/31459
dc.identifier.wosnumberWOS:000080437000097
dc.language.isoen_USen_US
dc.subjectbio-materialen_US
dc.subjectC3N4en_US
dc.subjectsputteringen_US
dc.titleNano-carbon nitride synthesis from a bio-molecular target for ion beam sputtering at low temperatureen_US
dc.typeArticle; Proceedings Paperen_US

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