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增強型氮化鎵電晶體及其形成方法

dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201445737zh_TW
dc.contributor.author張翼en_US
dc.contributor.author林岳欽en_US
dc.contributor.author王煥中en_US
dc.date.accessioned2014-12-16T06:17:32Z
dc.date.available2014-12-16T06:17:32Z
dc.date.issued2014-12-01en_US
dc.description.abstract一種增強型氮化鎵電晶體,其結構由下而上包括:基板、異質結構、p型元素磊晶成長層、汲極歐姆接觸及源極歐姆接觸設置在異質結構上且設至於p型元素磊晶成長層之兩側邊、閘極結構設置在p型元素磊晶成長層上且與汲極歐姆接觸及源極歐姆接觸彼此分離以及表面鈍化層包覆汲極歐姆接觸、源極歐姆接觸、p型元素磊晶成長層及覆蓋部份閘極結構,藉由異質結構與p型元素磊晶成長層在閘極結構下方可以形成P-N接面,而成為具有高輸出電流之增強型氮化鎵電晶體。zh_TW
dc.identifier.govdocH01L029/78zh_TW
dc.identifier.govdocH01L021/28zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/106476
dc.language.isozh_TWen_US
dc.title增強型氮化鎵電晶體及其形成方法zh_TW
dc.typePatentsen_US

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