大面積光刻製程用之全反射軟性光罩設計
| dc.contributor.author | 洪紹剛 | zh_TW |
| dc.contributor.department | 國立交通大學機械工程學系（所） | zh_TW |
| dc.date.accessioned | 2016-12-20T03:56:45Z | |
| dc.date.available | 2016-12-20T03:56:45Z | |
| dc.date.issued | 2016 | en_US |
| dc.description.abstract | zh_TW | |
| dc.description.abstract | en_US | |
| dc.description.sponsorship | 科技部 | zh_TW |
| dc.identifier.govdoc | MOST105-2221-E009-060 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=11881354&docId=485938 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/131814 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | zh_TW | |
| dc.subject | en_US | |
| dc.title | 大面積光刻製程用之全反射軟性光罩設計 | zh_TW |
| dc.title | Design of the Total-Internal-Reflection-Based Soft Photomask for Large-Area Photolithography | en_US |
| dc.type | Plan | en_US |
Files
License bundle
1 - 1 of 1
Loading...
- Name:
- license.txt
- Size:
- 1.71 KB
- Format:
- Item-specific license agreed to upon submission
- Description: