以UHV/CVD低溫成長複晶薄膜及其金屬矽化物於次微米元件之應用
| dc.contributor.author | 雷添福 | en_US |
| dc.contributor.author | LEI TAN-FU | en_US |
| dc.contributor.department | 國立交通大學電子工程研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:39:03Z | |
| dc.date.available | 2014-12-13T10:39:03Z | |
| dc.date.issued | 1996 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC85-2215-E009-051 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=218531&docId=38691 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/96018 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 以UHV/CVD低溫成長複晶薄膜及其金屬矽化物於次微米元件之應用 | zh_TW |
| dc.title | Low Temperature Growth of Polycrystalline Silicon by UHV/CVD and Its Metal Silicide for the Application of Submicron Devices | en_US |
| dc.type | Plan | en_US |
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