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TOP-GATE TRANSISTOR ARRAY SUBSTRATE

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20130009144zh_TW
dc.contributor.authorCHENG Huang-Chungen_US
dc.contributor.authorHUANG Yu-Chihen_US
dc.contributor.authorYANG Po-Yuen_US
dc.contributor.authorCHIANG Shin-Chuanen_US
dc.contributor.authorLI Huai-Anen_US
dc.date.accessioned2014-12-16T06:15:02Z
dc.date.available2014-12-16T06:15:02Z
dc.date.issued2013-01-10en_US
dc.description.abstractA top-gate transistor array substrate includes a transparent substrate with a plane, an ion release layer, a pixel array, and a first insulating layer. The ion release layer is disposed on the transparent substrate and completely covers the plane. The pixel array is disposed on the ion release layer and includes a plurality of transistors and a plurality of pixel electrodes. Each of the transistors includes a source, a drain, a gate and a MOS (metal oxide semiconductor) layer. The drain, the source and the MOS layer are disposed on the ion release layer. The pixel electrodes are electrically connected to the drains respectively. The gate is disposed above the MOS layer. The first insulating layer is disposed between the MOS layers and the gates. The MOS layer contacts the ion release layer. The ion release layer can release a plurality of ions into the MOS layers.zh_TW
dc.identifier.govdocH01L029/24zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/105088
dc.language.isozh_TWen_US
dc.titleTOP-GATE TRANSISTOR ARRAY SUBSTRATEzh_TW
dc.typePatentsen_US

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