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Effect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-off

dc.citation.epage128en_US
dc.citation.spage122en_US
dc.citation.volume5739en_US
dc.contributor.authorChu, JTen_US
dc.contributor.authorLiang, WDen_US
dc.contributor.authorKao, CCen_US
dc.contributor.authorHuang, HWen_US
dc.contributor.authorChu, CFen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:25:13Z
dc.date.available2014-12-08T15:25:13Z
dc.date.issued2005en_US
dc.description.abstractLarge-area (1000x1000 gm) p-side down InGaN light-emitting diodes (LEDs) have been fabricated by laser lift-off (LLO) technique. The p-side down LEDs with different geometric patterns of n-electrode were fabricated to investigate electrode pattern-dependent optical characteristics. Current crowding effect was first observed in in the p-side down InGaN LLO-LEDs. The LEDs with well designed n-electrode shows a uniform distribution of light-emitting pattern and higher out put power due to uniform current spreading and minimization of thermal effect. The output power saturation induced by current crowding in the LEDs with simplest geometric n-electrode was demonstrated. In absent of transparent contact layer for current spreading, the n-electrode pattern has remarkable influence on the current distribution and consequently the light output power of the large-area p-side down LEDs.en_US
dc.identifier.doi10.1117/12.583288en_US
dc.identifier.isbn0-8194-5713-2en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.journalLight-Emitting Diodes: Research, Manufacturing, and Applications IXen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.583288en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/17601
dc.identifier.wosnumberWOS:000228826900016
dc.language.isoen_USen_US
dc.subjectGaN LEDsen_US
dc.subjectlaser lift-off (LLO)en_US
dc.subjectwafer bondingen_US
dc.subjectlarge-area light-emitting LEDsen_US
dc.titleEffect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-offen_US
dc.typeProceedings Paperen_US

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