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A physically-based built-in Spice Poly-Si TFT model for circuit simulation and reliability evaluation

dc.citation.epage142en_US
dc.citation.spage139en_US
dc.contributor.authorChung, SSen_US
dc.contributor.authorChen, DCen_US
dc.contributor.authorCheng, CTen_US
dc.contributor.authorYeh, CFen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:27:33Z
dc.date.available2014-12-08T15:27:33Z
dc.date.issued1996en_US
dc.description.abstractA Poly-Si TFT model for circuit simulation in Spice is presented, combined with a device degradation model for the first time to evaluate the circuit reliability. Both I-V and C-V models for the whole device operating regime have been developed. In the I-V model, emphasis has been taken to derive the mobility degradation induced by the grain boundary potantial barrier height and trap density. The small geometry effect, off-state current and the parasitic BJT effect are also considered in the model. Good agreements between modeled and experimental data were achieved. To evaluate the circuit reliability after electrical stress, the device reliability model has also been developed. Finally, simulation a 27-stage ring oscillator has been demonstrated, which shows delay time of about 1 nsec per stage.en_US
dc.identifier.doi10.1109/IEDM.1996.553140en_US
dc.identifier.isbn0-7803-3394-2en_US
dc.identifier.journalIEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996en_US
dc.identifier.urihttp://dx.doi.org/10.1109/IEDM.1996.553140en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/19788
dc.identifier.wosnumberWOS:A1996BG98F00030
dc.language.isoen_USen_US
dc.titleA physically-based built-in Spice Poly-Si TFT model for circuit simulation and reliability evaluationen_US
dc.typeProceedings Paperen_US

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