超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體的製作與可靠度之研究---子計畫I：化學氣相沈積系統成長低溫複晶矽薄膜電晶體及其在投影式液晶顯示器的應用

dc.contributor.author	張鼎張	en_US
dc.contributor.author	TING-CHANGCHANG	en_US
dc.contributor.department	國立交通大學毫微米實驗室	zh_TW
dc.date.accessioned	2014-12-13T10:36:40Z
dc.date.available	2014-12-13T10:36:40Z
dc.date.issued	1999	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC88-2215-E317-009	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=428670&docId=76707	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/94093
dc.language.iso	zh_TW	en_US
dc.subject	高真空	zh_TW
dc.subject	化學氣相沈積法	zh_TW
dc.subject	多晶矽	zh_TW
dc.subject	薄膜電晶體	zh_TW
dc.subject	High Vacuum	en_US
dc.subject	Chemical vapor deposition (CVD)	en_US
dc.subject	Polycrystalline silicon	en_US
dc.subject	Thin film transistor (TFT)	en_US
dc.title	超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體的製作與可靠度之研究---子計畫I：化學氣相沈積系統成長低溫複晶矽薄膜電晶體及其在投影式液晶顯示器的應用	zh_TW
dc.title	Fabrication of UHVCVD Low Temperature Poly-Si TFTs and Its Applications to Projection Liquid Crystal display	en_US
dc.type	Plan	en_US

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