Characterization of diamond nanoplatelets
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DOI
10.1016/j.diamond.2003.11.013
Abstract
Diamond deposition at a temperature above 1000 degreesC was carried out in a microwave plasma chemical vapor deposition reactor using a 3% CH4/H-2 gas mixture. A polycrystalline diamond substrate was coated with a thin film of nickel in 100-nm thickness before deposition. Electron microscopy characterization of electron diffraction, high-resolution imaging, and electron energy loss spectroscopy shows that the diamonds deposited exhibit regular shapes in triangles and parallelogram with well-faceted surfaces. These diamond platelets are single crystallites with a uniform thickness of approximately 30-70 nm and length of several hundred nanometers to a few micrometers. The platelet morphology suggests that it is formed by lateral growth. Also, it was found that the diamonds are covered with a 1 to 2-nm thick graphite films in epitaxy. (C) 2003 Elsevier B.V. All rights reserved.