單晶之CVD薄膜和熔化成長法製程中的不穩定熱流與使其穩定之研究---總計畫(I)

dc.contributor.author	林清發	en_US
dc.contributor.author	LIN TSING-FA	en_US
dc.contributor.department	國立交通大學機械工程學系	zh_TW
dc.date.accessioned	2014-12-13T10:38:50Z
dc.date.available	2014-12-13T10:38:50Z
dc.date.issued	1996	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC85-2212-E009-030	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=230687&docId=41960	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/95781
dc.language.iso	zh_TW	en_US
dc.subject	薄膜單晶	zh_TW
dc.subject	浮力	zh_TW
dc.subject	不穩定熱流	zh_TW
dc.subject	化學蒸鍍法	zh_TW
dc.subject	晶體生長	zh_TW
dc.subject	Thin film single crystal	en_US
dc.subject	Buoyancy	en_US
dc.subject	Unstable flow	en_US
dc.subject	CVD	en_US
dc.subject	Crystal growth	en_US
dc.title	單晶之CVD薄膜和熔化成長法製程中的不穩定熱流與使其穩定之研究---總計畫(I)	zh_TW
dc.title	A Study of Generic Unstable Flow and Heat Transfer and Its Stabilization in CVD Thin Film and Melt Growth of Single Crystals(I)	en_US
dc.type	Plan	en_US

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