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Radiation,Temperature and Gain in n-p-n Planar Transistor

dc.citation.epage50en_US
dc.citation.issue1en_US
dc.citation.spage41en_US
dc.citation.volume2en_US
dc.contributor.author張俊彥zh_TW
dc.contributor.author郭双發zh_TW
dc.contributor.authorC.Y.Changen_US
dc.contributor.authorS.F.Guoen_US
dc.date.accessioned2017-10-06T06:17:33Z
dc.date.available2017-10-06T06:17:33Z
dc.date.issued1966-10en_US
dc.description.abstractThe dependence of current amplification factor on emitter current, temperature, resistivities, surface treatments as well as on the radiation effects are investigated. The experiments show that the current amplification factor is more dependent on recombination and scattering mechanism than the other effects. Temperature effect is profound also, high temperature causes high gain(400% at 200℃), low temperature causes very low gain (5% at liquid oxygen). Both the neutron and the Υ-ray irradiation cause the Frenkel defect in the crystal and thus also decrease the current gain preatly. Recovery of gain is obtained by heating at 300℃, 150℃ etc. in dry nitrogen atmosphere and then followed by quick annealing.en_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/137421
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleRadiation,Temperature and Gain in n-p-n Planar Transistoren_US
dc.typeCampus Publicationsen_US

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