The Effect of X-ray Irradiation on the Novella Type Photoresist
| dc.citation.epage | 1063 | en_US |
| dc.citation.spage | 1063 | en_US |
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | You, Hsin-Chiang | en_US |
| dc.contributor.author | Shieh, Shao-Hui | en_US |
| dc.contributor.author | Zhang, Shiang-Jun | en_US |
| dc.contributor.author | Ko, Fu-Hsiang | en_US |
| dc.contributor.author | Lin, Hsiung-Min | en_US |
| dc.contributor.author | Tsaur, Shyh-Chang | en_US |
| dc.contributor.author | Lin, Chin-Che | en_US |
| dc.contributor.department | 材料科學與工程學系奈米科技碩博班 | zh_TW |
| dc.contributor.department | Graduate Program of Nanotechnology , Department of Materials Science and Engineering | en_US |
| dc.date.accessioned | 2017-04-21T06:49:52Z | |
| dc.date.available | 2017-04-21T06:49:52Z | |
| dc.date.issued | 2010 | en_US |
| dc.identifier.isbn | 978-1-4244-3543-2 | en_US |
| dc.identifier.journal | INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/134877 | |
| dc.identifier.wosnumber | WOS:000282026500542 | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | The Effect of X-ray Irradiation on the Novella Type Photoresist | en_US |
| dc.type | Proceedings Paper | en_US |
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