AlSixOy as a high transmittance embedded material for AttPSM and the correlation between the chemical compositions and optical properties of AlSixOy in 193 nm lithography
| dc.citation.epage | 13 | en_US |
| dc.citation.spage | 12 | en_US |
| dc.contributor.author | Lin, CM | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:27:05Z | |
| dc.date.available | 2014-12-08T15:27:05Z | |
| dc.date.issued | 2000 | en_US |
| dc.identifier.isbn | 4-89114-004-6 | en_US |
| dc.identifier.journal | MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19309 | |
| dc.identifier.wosnumber | WOS:000166793600006 | |
| dc.language.iso | en_US | en_US |
| dc.title | AlSixOy as a high transmittance embedded material for AttPSM and the correlation between the chemical compositions and optical properties of AlSixOy in 193 nm lithography | en_US |
| dc.type | Proceedings Paper | en_US |
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