高介電常數鈦酸鍶基閘極氧化物及元件的製作、結構與特性研究(III)
| dc.contributor.author | 曾俊元 | en_US |
| dc.contributor.author | TSENG TSEUNG-YUEN | en_US |
| dc.contributor.department | 交通大學電子工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:29:20Z | |
| dc.date.available | 2014-12-13T10:29:20Z | |
| dc.date.issued | 2006 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC95-2221-E009-278 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=1309524&docId=241992 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/89149 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 高介電常數鈦酸鍶基閘極氧化物及元件的製作、結構與特性研究(III) | zh_TW |
| dc.title | Investigations of High-K SrTiO/sub 3/-Base Gate Dielectrics and Devices Fabrication and Their Structures and Properties(III) | en_US |
| dc.type | Plan | en_US |
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