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Physical characteristics and photoluminescence properties of phosphorous-implanted ZnO thin films

dc.citation.epage409en_US
dc.citation.issue1-4en_US
dc.citation.spage405en_US
dc.citation.volume238en_US
dc.contributor.authorLin, CCen_US
dc.contributor.authorChen, SYen_US
dc.contributor.authorCheng, SYen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:37:18Z
dc.date.available2014-12-08T15:37:18Z
dc.date.issued2004-11-15en_US
dc.description.abstractZnO films were implanted with phosphorus in the range from 5 x 10(12) to 5 x 10(15) cm(-2). Effect of phosphorus concentration on structural characteristics and photoelectric behavior of phosphorus-implanted ZnO films under different atmosphere and annealing treatment was investigated. It has been demonstrated that below solubility (1.5 x 10(18) ions/cm(3)), the defect formation will be dominated by annealing atmosphere and more defects can be formed in oxygen ambient than in nitrogen atmosphere as revealed from PL spectra. However, excess phosphorus doping, above solubility (1.5 x 10(18) ions/cm(3)), will induce the formation of the phosphide compounds in ZnO films and seriously deteriorate the crystallinity and optical property of the films. However, a high-resistive but not p-type ZnO film is obtained by phosphorus doping. (C) 2004 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.apsusc.2004.05.255en_US
dc.identifier.issn0169-4332en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2004.05.255en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25641
dc.identifier.wosnumberWOS:000224655200077
dc.language.isoen_USen_US
dc.subjectZnOen_US
dc.subjectphosphorus implantationen_US
dc.subjectphotoluminescenceen_US
dc.subjectdefect chemistryen_US
dc.titlePhysical characteristics and photoluminescence properties of phosphorous-implanted ZnO thin filmsen_US
dc.typeArticle; Proceedings Paperen_US

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