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X頻帶雙飄移高低高矽衝渡二極體之準靜態設計規範

dc.citation.epage=O35-1en_US
dc.citation.spage49en_US
dc.citation.volume2en_US
dc.contributor.author張懋中zh_TW
dc.contributor.author陳茂傑zh_TW
dc.contributor.authorMau-Chung Changen_US
dc.contributor.authorMao-Chieh Chenen_US
dc.date.accessioned2017-10-06T06:22:44Z
dc.date.available2017-10-06T06:22:44Z
dc.date.issued1976-12en_US
dc.description.abstractA modified quasi-static model is developed to optimize the power efficiency of double-drift X-band Lo-Hi-Lo IMPATT diodes. We take the ionization rates and scattering-limited velocities for electrons and holes to be not equal at an operation temperature of 150 ℃, and let the carriers' ionization coefficient be in the form α=A*exp(-B/E),where E is the electric field.We maintain the carriers' velocities at saturation and solve for a steady state solution. All these assumptions not only save computer time, but also give us essential physical features.Current tuning effect is concluded as the most important factor in designing the device structure.Large signal values of negative conductance, susceptance,r.f. power generation efficiency are calculated as a function of the oscillation voltage amplitude for a specified bias current density. All of these informations would provide a useful guidance for both device and circuit designers.en_US
dc.identifier.journal交通大學學報zh_TW
dc.identifier.journalThe Journal of National Chiao Tung Universityen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/137560
dc.language.isoen_USen_US
dc.titleX頻帶雙飄移高低高矽衝渡二極體之準靜態設計規範zh_TW
dc.titleQuasi-Static Design Considerations of X-Band Double Drift Lo-Hi-Lo Silicon IMPATT Diodesen_US
dc.typeCampus Publicationsen_US

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