新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM)

dc.contributor.author	余沛慈	en_US
dc.contributor.author	Yu Peichen	en_US
dc.contributor.department	國立交通大學光電工程學系(所)	zh_TW
dc.date.accessioned	2014-12-13T10:49:40Z
dc.date.available	2014-12-13T10:49:40Z
dc.date.issued	2009	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC98-2221-E009-111-MY2	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=1903573&docId=315423	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/101732
dc.language.iso	zh_TW	en_US
dc.title	新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM)	zh_TW
dc.title	Inverse Lithography Solution for Optical Proximity Correction and Design for Manufacturing for CMOS 32nm Node and beyond	en_US
dc.type	Plan	en_US

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