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Structure and process of basic complementary logic gate made by junctionless transistors

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20120126197zh_TW
dc.contributor.authorChung Steve S.en_US
dc.contributor.authorHsieh E. R.en_US
dc.date.accessioned2014-12-16T06:15:13Z
dc.date.available2014-12-16T06:15:13Z
dc.date.issued2012-05-24en_US
dc.description.abstractThe present invention discloses a structure and process of basic complementary logic gate made by junctionless transistors. Junctionless N-channel transistor(s) and junctionless P-channel transistor(s) are formed on a semiconductor wafer, a conducting contact structure is used to connect the transistors to form a basic complementary logic gate(s) such as inverter, NAND, NOR, etc.zh_TW
dc.identifier.govdocH01L027/092zh_TW
dc.identifier.govdocH01L021/782zh_TW
dc.identifier.govdocH01L021/8238zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/105177
dc.language.isozh_TWen_US
dc.titleStructure and process of basic complementary logic gate made by junctionless transistorszh_TW
dc.typePatentsen_US

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