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Method of forming single-layer photonic crystal structure

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber08574415zh_TW
dc.contributor.authorWu Pu-Weien_US
dc.contributor.authorHuang Yi-Juien_US
dc.date.accessioned2014-12-16T06:13:58Z
dc.date.available2014-12-16T06:13:58Z
dc.date.issued2013-11-05en_US
dc.description.abstractA method of forming a single-layer photonic crystal structure. The method includes depositing electrophoretic suspension, working electrode and lower electrode in a container, wherein the working electrode and the lower electrode are formed at upper and lower parts of the container, respectively, and spaced apart at an distance; and applying an electric voltage to the working electrode and the lower electrode to form an electric field, such that particles in the electrophoretic suspension form a single-layer photonic crystal structure on the working electrode under interactive actions of the electric field and a gravity field by an electrophoresis self-assembly technique. Therefore, the single-layer photonic crystal structure has a low cost, and good quality and recurring property.zh_TW
dc.identifier.govdocC25D013/02zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/104427
dc.language.isozh_TWen_US
dc.titleMethod of forming single-layer photonic crystal structurezh_TW
dc.typePatentsen_US

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