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單晶CVD薄膜和熔化成長法製程中之不穩定熱流與使其穩定研究---子計畫一:水平單晶成長之不穩定熱流實驗與數值模擬研究(III)

dc.contributor.author林清發en_US
dc.contributor.authorLIN TSING-FAen_US
dc.contributor.department交通大學機械工程系zh_TW
dc.date.accessioned2014-12-13T10:38:05Z
dc.date.available2014-12-13T10:38:05Z
dc.date.issued1998en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC87-2212-E009-029zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=353163&docId=63027en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/95033
dc.language.isozh_TWen_US
dc.subject薄膜單晶zh_TW
dc.subject浮力zh_TW
dc.subject慣性力zh_TW
dc.subject渦流zh_TW
dc.subject對流zh_TW
dc.subject化學氣相沈積法zh_TW
dc.subjectThin film single crystalen_US
dc.subjectBuoyancyen_US
dc.subjectInertia forceen_US
dc.subjectVortexen_US
dc.subjectConvectionen_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.title單晶CVD薄膜和熔化成長法製程中之不穩定熱流與使其穩定研究---子計畫一:水平單晶成長之不穩定熱流實驗與數值模擬研究(III)zh_TW
dc.titleExperimental and Numerical Study of Unstable Flow and Heat Transfer in Horizontal CVD Growth of Single Crystal (III)en_US
dc.typePlanen_US

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