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Low noise and high gain RF MOSFETs on plastic substrates

dc.citation.epage298en_US
dc.citation.spage295en_US
dc.contributor.authorKao, HLen_US
dc.contributor.authorChin, Aen_US
dc.contributor.authorHuang, CCen_US
dc.contributor.authorHung, BFen_US
dc.contributor.authorChiang, KCen_US
dc.contributor.authorLai, ZMen_US
dc.contributor.authorMcAlister, SPen_US
dc.contributor.authorChi, CCen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:25:25Z
dc.date.available2014-12-08T15:25:25Z
dc.date.issued2005en_US
dc.description.abstractA low minimum noise figure (NFmin) of 1.2 dB and high associated gain of 12.8 dB at 10 GHz, were measured for 0.18 mu m RF MOSFETs on plastic, made by substrate thinning (similar to 30 mu m), transfer and bonding. The performance can be further improved to 0.96 dB NFmin and 14.1 dB associated gain at 10 GHz, under applied tensile strain, using flexible Si on plastic. A 3.5 nH inductor on plastic showed a 55% higher Q-factor with a wider frequency range, compared with that on a Si substrate.en_US
dc.identifier.doi10.1109/MWSYM.2005.1516584en_US
dc.identifier.isbn0-7803-8845-3en_US
dc.identifier.issn0149-645Xen_US
dc.identifier.journal2005 IEEE MTT-S International Microwave Symposium, Vols 1-4en_US
dc.identifier.urihttp://dx.doi.org/10.1109/MWSYM.2005.1516584en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/17808
dc.identifier.wosnumberWOS:000234561200068
dc.language.isoen_USen_US
dc.subjectRF noiseen_US
dc.subjectassociated gainen_US
dc.subjectMOSFETen_US
dc.subjectplasticen_US
dc.titleLow noise and high gain RF MOSFETs on plastic substratesen_US
dc.typeProceedings Paperen_US

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