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Ge/Al bilayer thin film for optical write-once media

dc.citation.epage0en_US
dc.citation.spage0en_US
dc.citation.volume6620en_US
dc.citation.woscount0en_US
dc.contributor.authorWu, T. H.en_US
dc.contributor.authorKuo, P. C.en_US
dc.contributor.authorChen, Jung-Poen_US
dc.contributor.authorWu, Chih-Yuanen_US
dc.contributor.authorYen, Po-Fuen_US
dc.contributor.authorJeng, Tzuan-Renen_US
dc.contributor.authorHuang, Der-Rayen_US
dc.contributor.authorOu, Sin-Liangen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2019-04-03T06:47:08Z
dc.date.available2019-04-03T06:47:08Z
dc.date.issued2007-01-01en_US
dc.description.abstractGe/Al bilayer thin films are prepared by magnetron sputtering. Thermal analysis shows that the phase change of the film occurs at 275 degrees C. Contrasts at 650 rim and 405 nm wavelength are 71.4% and 31.1% respectively.en_US
dc.identifier.doi10.1117/12.738895en_US
dc.identifier.isbn978-0-8194-6762-1en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.journalOPTICAL DATA STORAGE 2007en_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.738895en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/146555
dc.identifier.wosnumberWOS:000250199900050en_US
dc.language.isoen_USen_US
dc.titleGe/Al bilayer thin film for optical write-once mediaen_US
dc.typeProceedings Paperen_US

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