學研合作計畫-極紫外光微影技術II (EUVL II)-從光源、檢測分析技術到奈米元件可靠度研究(III)

dc.contributor.author	黃遠東	en_US
dc.contributor.author	HUANG YANG-TUNG	en_US
dc.contributor.department	國立交通大學電子工程學系及電子研究所	zh_TW
dc.date.accessioned	2014-12-13T10:31:04Z
dc.date.available	2014-12-13T10:31:04Z
dc.date.issued	2013	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC102-2120-M009-005	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=3104377&docId=420207	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/90684
dc.language.iso	zh_TW	en_US
dc.title	學研合作計畫-極紫外光微影技術II (EUVL II)-從光源、檢測分析技術到奈米元件可靠度研究(III)	zh_TW
dc.title	Investigations on Extreme Ultraviolet Lithography II (EUVL II)- from Light Source, Metrology, to Reliability of Nano Devices	en_US
dc.type	Plan	en_US

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