金屬線及空氣低介電常數介電質前瞻性積體技術開發(I)
| dc.contributor.author | 張國明 | en_US |
| dc.contributor.author | CHANG KOW-MING | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:45:25Z | |
| dc.date.available | 2014-12-13T10:45:25Z | |
| dc.date.issued | 2000 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC89-2215-E009-090 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=583838&docId=109693 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/100350 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 金屬線及空氣低介電常數介電質前瞻性積體技術開發(I) | zh_TW |
| dc.title | Advanced Integration Techonology of Intermetal and Air Gap Low k Dielectrics for ULSI Application(I) | en_US |
| dc.type | Plan | en_US |
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