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A shield-based three-port de-embedding method for microwave on-wafer characterization of deep-submicrometer silicon MOSFETs

dc.citation.epage2934en_US
dc.citation.issue9en_US
dc.citation.spage2926en_US
dc.citation.volume53en_US
dc.contributor.authorCho, MHen_US
dc.contributor.authorHuang, GWen_US
dc.contributor.authorWu, LKen_US
dc.contributor.authorChiu, CSen_US
dc.contributor.authorWang, YHen_US
dc.contributor.authorChen, KMen_US
dc.contributor.authorTsen, HCen_US
dc.contributor.authorHsu, TLen_US
dc.contributor.department電信工程研究所zh_TW
dc.contributor.departmentInstitute of Communications Engineeringen_US
dc.date.accessioned2014-12-08T15:18:34Z
dc.date.available2014-12-08T15:18:34Z
dc.date.issued2005-09-01en_US
dc.description.abstractA general three.-port S-parameter de-embedding method using shield-based test structures for microwave on-wafer characterization is presented in this paper. This method does not require any physical equivalent-circuit assumption for the surrounding parasitics of a device-under-test. We use one open and three thru dummy devices to remove the parasitic components connected to the gate, drain, and source terminals of a MOSFET. By shielding the lossy silicon substrate, the cross-coupling from port to port can be significantly mitigated, and thus, the parasitics of probe pads and interconnects at each port can be separately subtracted. The MOS transistor and its corresponding dummy structures fabricated in a 0.18-mu m CMOS process were characterized up to 20 GHz. Compared with the two-port cascade-based de-embedding method, the proposed three-port de-embedding procedure can further eliminate the parasitics associated with the dangling leg in the source terminal. The impacts of the accuracy of the de-embedding technique on device modeling and simulation are also discussed.en_US
dc.identifier.doi10.1109/TMTT.2005.854245en_US
dc.identifier.issn0018-9480en_US
dc.identifier.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUESen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMTT.2005.854245en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13371
dc.identifier.wosnumberWOS:000231721300034
dc.language.isoen_USen_US
dc.subjectde-embeddingen_US
dc.subjectMOSFETen_US
dc.subjectparasitiesen_US
dc.subjectscattering parametersen_US
dc.titleA shield-based three-port de-embedding method for microwave on-wafer characterization of deep-submicrometer silicon MOSFETsen_US
dc.typeArticle; Proceedings Paperen_US

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