A NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALING
| dc.citation.epage | 336 | en_US |
| dc.citation.spage | 333 | en_US |
| dc.contributor.author | SUN, SC | en_US |
| dc.contributor.author | CHEN, TF | en_US |
| dc.contributor.department | 奈米中心 | zh_TW |
| dc.contributor.department | Nano Facility Center | en_US |
| dc.date.accessioned | 2014-12-08T15:27:51Z | |
| dc.date.available | 2014-12-08T15:27:51Z | |
| dc.date.issued | 1994 | en_US |
| dc.identifier.isbn | 0-7803-2111-1 | en_US |
| dc.identifier.journal | INTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGEST | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/20109 | |
| dc.identifier.wosnumber | WOS:A1994BC55U00076 | |
| dc.language.iso | en_US | en_US |
| dc.title | A NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALING | en_US |
| dc.type | Proceedings Paper | en_US |
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