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Read Current Instability Arising from Random Telegraph Noise in Localized Storage, Multi-Level SONOS Flash Memory

dc.citation.epage+en_US
dc.citation.spage214en_US
dc.citation.woscount0en_US
dc.contributor.authorGu, S. H.en_US
dc.contributor.authorLi, C. W.en_US
dc.contributor.authorWang, Tahuien_US
dc.contributor.authorLu, W. P.en_US
dc.contributor.authorChen, K. C.en_US
dc.contributor.authorKu, Josephen_US
dc.contributor.authorLu, Chih-Yuanen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2017-04-21T06:48:24Z
dc.date.available2017-04-21T06:48:24Z
dc.date.issued2006en_US
dc.description.abstractProgram/erase cycling stress induced read current fluctuations arising from random telegraph noise (RTN) in a localized storage, multi-level nitride flash memory (SONOS) is explored. Our study shows that localized charge storage significantly enhances RTN. The amplitude of RTN varies in different program levels of a multi-level cell. The broadening of read current distribution due to RTN is characterized and modeled. Improvement of bottom oxide robustness can reduce the read current fluctuations.en_US
dc.identifier.isbn978-1-4244-0438-4en_US
dc.identifier.journal2006 INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/135213
dc.identifier.wosnumberWOS:000247357700056en_US
dc.language.isoen_USen_US
dc.title<bold>Read Current Instability Arising from Random Telegraph Noise in Localized Storage, Multi-Level SONOS Flash Memory</bold>en_US
dc.typeProceedings Paperen_US

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