12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III)
| dc.contributor.author | 林清發 | en_US |
| dc.contributor.author | LIN TSING-FA | en_US |
| dc.contributor.department | 交通大學機械工程研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:34:53Z | |
| dc.date.available | 2014-12-13T10:34:53Z | |
| dc.date.issued | 2002 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC91-2212-E009-038 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=782996&docId=150396 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/93056 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III) | zh_TW |
| dc.title | Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (III) | en_US |
| dc.type | Plan | en_US |