限制驅導排程方法在晶圓廠黃光區之應用
| dc.contributor.author | 李榮貴 | en_US |
| dc.contributor.author | LI RONG-KWEI | en_US |
| dc.contributor.department | 國立交通大學工業工程與管理學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:38:15Z | |
| dc.date.available | 2014-12-13T10:38:15Z | |
| dc.date.issued | 2001 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC90-2218-E009-020 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=674289&docId=128525 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/95153 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 晶圓製造 | zh_TW |
| dc.subject | 光刻術 | zh_TW |
| dc.subject | 限制理論 | zh_TW |
| dc.subject | Wafer fabrication | en_US |
| dc.subject | Photolithography | en_US |
| dc.subject | Theory of constraint | en_US |
| dc.title | 限制驅導排程方法在晶圓廠黃光區之應用 | zh_TW |
| dc.title | An Application of TOC for Photolithography Area in Wafer Fabrication Factory | en_US |
| dc.type | Plan | en_US |
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