自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究
| dc.contributor.author | 黃調元 | en_US |
| dc.contributor.author | TIAO-YUANHUANG | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:36:17Z | |
| dc.date.available | 2014-12-13T10:36:17Z | |
| dc.date.issued | 2000 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC89-2215-E009-105 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=583894&docId=109708 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/93841 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究 | zh_TW |
| dc.title | Thermeal Stability of Co Salicide and Its Impact on the Characteristics of Ultra-Thin Gate Oxides | en_US |
| dc.type | Plan | en_US |