氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(III)
| dc.contributor.author | 趙天生 | en_US |
| dc.contributor.author | CHAO TIEN-SHENG | en_US |
| dc.contributor.department | 國立交通大學電子物理學系(所) | zh_TW |
| dc.date.accessioned | 2014-12-13T10:28:44Z | |
| dc.date.available | 2014-12-13T10:28:44Z | |
| dc.date.issued | 2007 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC96-2221-E009-189 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=1471819&docId=264231 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/88580 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(III) | zh_TW |
| dc.title | Processes and System Development of HF-Vapor for Nano MOSFETs' Application(III) | en_US |
| dc.type | Plan | en_US |
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