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Novel Omega-Shaped-Gated TFT SONOS Memory

dc.citation.epage168en_US
dc.citation.issue7en_US
dc.citation.spage163en_US
dc.citation.volume25en_US
dc.contributor.authorLiao, Ta-Chuanen_US
dc.contributor.authorChen, Sheng-Kaien_US
dc.contributor.authorKang, Tsung-Kueien_US
dc.contributor.authorHsu, Pang-Yuen_US
dc.contributor.authorLin, Chia-Minen_US
dc.contributor.authorCheng, Huang-Chungen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:36:27Z
dc.date.available2014-12-08T15:36:27Z
dc.date.issued2009en_US
dc.description.abstractA novel omega-shaped-gated (Omega-Gate) polycrystalline-silicon thin-film transistor (TFT) silicon-oxide-nitride-oxide-silicon (SONOS) nonvolatile memory with field-enhanced nanowire (FEN) structure has been proposed to improve the program and erase (P/E) performance. Each nanowire inherently had twin sharp corners fabricated simply by sidewall spacer formation to obtain high local electric fields. The field-enhanced carrier tunneling via such a structure led to faster P/E speed and wider memory window for the Omega-Gate SONOS as compared to the conventional planar (CP) counterpart. Such an Omega-Gate-TFT SONOS memory using a simple process is very suitable for future system-on-panel applications.en_US
dc.identifier.doi10.1149/1.3203952en_US
dc.identifier.isbn978-1-60768-094-9; 978-1-56677-744-5en_US
dc.identifier.issn1938-5862en_US
dc.identifier.journalULSI PROCESS INTEGRATION 6en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3203952en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/24795
dc.identifier.wosnumberWOS:000338102400013
dc.language.isoen_USen_US
dc.titleNovel Omega-Shaped-Gated TFT SONOS Memoryen_US
dc.typeProceedings Paperen_US

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