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氮化銦鎵和氮砷化鎵三元化合物薄膜製備及光電物理性質研究

dc.contributor.author陳衛國en_US
dc.contributor.authorWEI-KUOCHENen_US
dc.contributor.department交通大學電子物理系zh_TW
dc.date.accessioned2014-12-13T10:46:05Z
dc.date.available2014-12-13T10:46:05Z
dc.date.issued2000en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC89-2112-M009-012zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=523763&docId=95131en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/100638
dc.language.isozh_TWen_US
dc.subject同價位元素雜質摻雜zh_TW
dc.subject氮砷化鎵zh_TW
dc.subject磊晶熱力學zh_TW
dc.subject有機金屬氣相磊晶zh_TW
dc.subject異質界面結構zh_TW
dc.subjectIsoelectronic dopingen_US
dc.subjectGaAsNen_US
dc.subjectThermodynamics growth modelen_US
dc.title氮化銦鎵和氮砷化鎵三元化合物薄膜製備及光電物理性質研究zh_TW
dc.titleEpitaxy and Characterization of InGaN and GaAsN Alloysen_US
dc.typePlanen_US

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