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在矽基板整合40奈米三五族與鍺量子井場效電晶體作為低功率與高速無線之應用(II)

dc.contributor.author張翼en_US
dc.contributor.authorCHANG EDWARD YIen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
dc.date.accessioned2014-12-13T10:45:03Z
dc.date.available2014-12-13T10:45:03Z
dc.date.issued2010en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC99-2120-M009-005zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=2149157&docId=346002en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/100259
dc.language.isozh_TWen_US
dc.subject量子井場效電晶體zh_TW
dc.subject砷化銦zh_TW
dc.subject超低功率zh_TW
dc.subject數位邏輯zh_TW
dc.subject原子層氣相沉積zh_TW
dc.subject表面處理zh_TW
dc.title在矽基板整合40奈米三五族與鍺量子井場效電晶體作為低功率與高速無線之應用(II)zh_TW
dc.titleIntegration of 40 nm III-V and Ge Quantum Well FETs on Si Substrate for Low-Power and High Speed Wireless Applications (II)en_US
dc.typePlanen_US

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